The influence of orientation and morphology on the passivation of crystalline silicon surfaces by Al2O3
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Black, Lachlan E.; Kho, Teng C.; McIntosh, Keith R.; Cuevas, Andres
Description
We compare the passivation provided by Al2O3 deposited on planar <100> and <111>, and textured <100>, boron-diffused and undiffused crystalline silicon surfaces. The passivation of <111> surfaces is found to be somewhat worse than that of <100> surfaces for the as-deposited films, but improves to similar values after annealing. Higher recombination at textured surfaces compared to planar <111> surfaces can be largely, though not entirely, attributed to the difference in surface area....[Show more]
Collections | ANU Research Publications |
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Date published: | 2014 |
Type: | Journal article |
URI: | http://hdl.handle.net/1885/13604 |
Source: | Energy Procedia |
DOI: | 10.1016/j.egypro.2014.08.055 |
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Black L E et al The influence of orientation 2014.pdf | 2.8 MB | Adobe PDF |
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