Liu, Lijun; Karuturi, Siva; Su, Liap Tat; Tok, Alfred ling Yoong
TiO2 inverse opals (TIO) fabricated by the atomic layer deposition (ALD) technique showed a superior infiltration result when compared to those fabricated by the conventional nanoparticles-infiltration method reported in previous studies. The ALD can achieve high filling fractions of more than ca. 96% of the maximum possible infiltration by conformal filling of 288, 390 and 510 nm opals, giving rise to high quality TIO. The photoelectrochemical performances of the ALD-fabricated TIO photoanodes...[Show more]
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