Skip navigation
Skip navigation

Simulation and suppression of the gas phase pre-reaction in metal-organic chemical vapor deposition of ZnO

Zhu, Guangyao; Gu, Shulin; Zhu, Shunming; Tang, Kun; Ye, Jiandong; Zhang, Rong; Yi, Shi; Zheng, Youdou


The reaction mechanism and simulations of the metal-organic chemical vapor deposition reactor for ZnO film growth are presented, indicating the temperature of the reaction species. The gas phase pre-reaction can be modulated by several factors or conditions. Simulations verify the relationships between temperature and pyrolysis of precursors, and further reveal that the substrate temperature and flow rate of cooling water have great impacts on the temperature distribution. The experimental...[Show more]

CollectionsANU Research Publications
Date published: 2011
Type: Journal article
Source: Chinese Physics Letters
DOI: 10.1088/0256-307X/28/11/116803


File Description SizeFormat Image
01_Zhu_Simulation_and_suppression_of_2011.pdf664.28 kBAdobe PDF    Request a copy

Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  23 August 2018/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator