Micro-structure analysis of He+ ion implanted KTP by TEM
Micro-structure of high dose He-implanted x-cut KTP is investigated. Rutherford backscattering spectroscopy/channeling (RBS/Channeling) and transmission electron microscopy (TEM) are used to examine the structural and lattice damage properties in KTP after 200keV He+-implantation and following thermal annealing. Lattice crack, lattice disorder and He-bubble are observed in different implantation regions. The results show that strain induced by implantation is released through non-elastic...[Show more]
|Collections||ANU Research Publications|
|Source:||Optical Materials Express|
|01_Ma_Micro-structure_analysis_of_2015.pdf||447.49 kB||Adobe PDF||Request a copy|
|02_Ma_Micro-structure_analysis_of_2015.pdf||851.01 kB||Adobe PDF||Request a copy|
Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.