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Micro-structure analysis of He+ ion implanted KTP by TEM

Ma, Yu-Jie; Lu, Fei; Ridgway, Mark C; Ma, Chang-Dong; Xu, Bo


Micro-structure of high dose He-implanted x-cut KTP is investigated. Rutherford backscattering spectroscopy/channeling (RBS/Channeling) and transmission electron microscopy (TEM) are used to examine the structural and lattice damage properties in KTP after 200keV He+-implantation and following thermal annealing. Lattice crack, lattice disorder and He-bubble are observed in different implantation regions. The results show that strain induced by implantation is released through non-elastic...[Show more]

CollectionsANU Research Publications
Date published: 2015
Type: Journal article
Source: Optical Materials Express
DOI: 10.1364/OME.5.000986


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