Micro-structure analysis of He+ ion implanted KTP by TEM
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Ma, Yu-Jie; Lu, Fei; Ridgway, Mark C; Ma, Chang-Dong; Xu, Bo
Description
Micro-structure of high dose He-implanted x-cut KTP is investigated. Rutherford backscattering spectroscopy/channeling (RBS/Channeling) and transmission electron microscopy (TEM) are used to examine the structural and lattice damage properties in KTP after 200keV He+-implantation and following thermal annealing. Lattice crack, lattice disorder and He-bubble are observed in different implantation regions. The results show that strain induced by implantation is released through non-elastic...[Show more]
Collections | ANU Research Publications |
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Date published: | 2015 |
Type: | Journal article |
URI: | http://hdl.handle.net/1885/102604 |
Source: | Optical Materials Express |
DOI: | 10.1364/OME.5.000986 |
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02_Ma_Micro-structure_analysis_of_2015.pdf | 851.01 kB | Adobe PDF | Request a copy |
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