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Dependence of extrinsic loss on group velocity in photonic crystal waveguides

O'Faolain, Liam; White, Thomas P.; O'Brien, David; Yuan, Xiadong; Settle, Michael D.; Krauss, Thomas F.

Description

We examine the effects of disorder on propagation loss as a function of group velocity for W1 photonic crystal (PhC) waveguides. Disorder is deliberately and controllably introduced into the photonic crystal by pseudo-randomly displacing the holes of the photonic lattice. This allows us to clearly distinguish two types of loss. Away from the band-edge and for moderately slow light (group velocity c/20-c/30) loss scales sub-linearly with group velocity, whereas near the band-edge, reflection...[Show more]

dc.contributor.authorO'Faolain, Liam
dc.contributor.authorWhite, Thomas P.
dc.contributor.authorO'Brien, David
dc.contributor.authorYuan, Xiadong
dc.contributor.authorSettle, Michael D.
dc.contributor.authorKrauss, Thomas F.
dc.date.accessioned2016-05-25T01:22:18Z
dc.date.available2016-05-25T01:22:18Z
dc.identifier.issn1094-4087
dc.identifier.urihttp://hdl.handle.net/1885/101707
dc.description.abstractWe examine the effects of disorder on propagation loss as a function of group velocity for W1 photonic crystal (PhC) waveguides. Disorder is deliberately and controllably introduced into the photonic crystal by pseudo-randomly displacing the holes of the photonic lattice. This allows us to clearly distinguish two types of loss. Away from the band-edge and for moderately slow light (group velocity c/20-c/30) loss scales sub-linearly with group velocity, whereas near the band-edge, reflection loss increases dramatically due to the random and local shift of the band-edge. The optical analysis also shows that the random fabrication errors of our structures, made on a standard e-beam lithography system, are below 1 nm root mean square.
dc.description.sponsorshipThomas P White was supported by an 1851 Royal Commission research fellowship and the research was funded by the EU-FP6 NoE “ePIXnet” and the EU-FP6 FET project “SPLASH”.
dc.publisherOptical Society of America
dc.rights© 2007 Optical Society of America
dc.sourceOptics Express
dc.subjectKeywords: Electron beam lithography; Error analysis; Fabrication; Light reflection; Light velocity; Optical waveguides; Photonic band gap; Band edge; e-beam lithography; Photonic crystal (PhC) waveguides; Photonic lattice; Reflection loss; Optical losses
dc.titleDependence of extrinsic loss on group velocity in photonic crystal waveguides
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume15
dc.date.issued2007
local.identifier.absfor020299
local.identifier.ariespublicationu3485190xPUB27
local.publisher.urlhttp://www.osa.org/en-us/home/
local.type.statusPublished Version
local.contributor.affiliationO'Faolain, Liam, University of St Andrews, United Kingdom
local.contributor.affiliationWhite, Thomas, College of Physical and Mathematical Sciences, CPMS Research School of Physics and Engineering, Nonlinear Physics Centre, The Australian National University
local.contributor.affiliationO'Brien, David, School of Physics and Astronomy, United Kingdom
local.contributor.affiliationYuan, Xiaodong, National University of Defense Technology, China
local.contributor.affiliationSettle, Michael D, School of Physics and Astronomy, United Kingdom
local.contributor.affiliationKrauss, Thomas F, University of St Andrews, United Kingdom
local.bibliographicCitation.issue20
local.bibliographicCitation.startpage13129
local.bibliographicCitation.lastpage13138
local.identifier.doi10.1364/OE.15.013129
dc.date.updated2016-06-14T08:38:59Z
local.identifier.scopusID2-s2.0-35148887087
dcterms.accessRightsOpen Access
CollectionsANU Research Publications

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