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Deposition and Characterization of Silica-Based Films by Helicon-Activated Reactive Evaporation Applied to Optical Waveguide Fabrication

Bulla, Douglas; Li, Wei-Tang; Charles, Christine; Boswell, Rod; Ankiewicz, Adrian; Love, John

Description

Planar silicon dioxide optical waveguides were deposited by use of a plasma-activated reactive evaporation system, at a low deposition temperature and with reduced hydrogen contamination, on thermally oxidized silicon wafers. The deposited films show a refractive-index inhomogeneity of less than 0.1%, a thickness nonuniformity of less than 5%, and a material birefringence of approximately 5 × 10-4. Rib-type channel waveguides were formed on the deposited films by means of hydrofluoric acid...[Show more]

CollectionsANU Research Publications
Date published: 2004
Type: Journal article
URI: http://hdl.handle.net/1885/101500
Source: Applied Optics
DOI: 10.1364/AO.43.002978

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