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Plasma ammonia passivation of SiN/SiO2/Si stacks

Author(s)Jin, Hao; Weber, Klaus; Blakers, Andrew
TypeConference paper
Date Published2006
Date CreatedJune 25-30, 2006

Passivation of LPCVD nitride silicon stacks by atomic H

Author(s)Jin, Hao; Weber, Klaus; Blakers, Andrew
TypeConference paper
Date Published2006
Date CreatedMay 8-12 2006

The effect of a post oxidation in-situ nitrogen anneal on Si surface passivation

Author(s)Jin, Hao; Weber, Klaus; Blakers, Andrew
TypeConference paper
Date Published2006
Date CreatedMay 8-12 2006

SLIVER Solar Cells

Author(s)Jin, Hao; Weber, Klaus; Deenapanray, Prakash; Everett, Vernie; Franklin, Evan; Jellett, Wendy; Blakers, Andrew
TypeConference paper
Date Published2005
Date CreatedOctober 10 2005

A Compare Study of LPCVD Silicon Nitride Deposited on (100) and (111) Silicon Surface

Author(s)Jin, Hao; Weber, Klaus; Blakers, Andrew
TypeConference paper
Date Published2005
Date CreatedOctober 10 2005

Defect generation concomitant with plasma nitridation to Si/SiO2 stacks at room temperature

Author(s)Jin, Hao; Weber, Klaus; Smith, Paul; Blakers, Andrew
TypeConference paper
Date Published2006
Date CreatedSeptember 13-15 2006

Comparison of plasma NH3 and atomic H effects to Si-SiO2 interface

Author(s)Jin, Hao; Weber, Klaus; Jayaprasad, A; Blakers, Andrew
TypeConference paper
Date Published2006
Date CreatedJune 25-30, 2006

Influence of Phosphorous Diffusion on the Si Surface Passivation

Author(s)Jin, Hao; Weber, Klaus; Jellett, Wendy; Blakers, Andrew
TypeConference paper
Date Published2007
Date CreatedSeptember 3-7 2007

Depassivation of Si-SiO2 interface following rapid thermal annealing

Author(s)Jin, Hao; Weber, Klaus; Blakers, Andrew
TypeConference paper
Date Published2006
Date CreatedMay 8-12 2006

Silicon/silicon oxide/LPCVD silicon nitride stacks: the effect of oxide thicknoww on bulk damage and surface passivation

Author(s)Jin, Hao; Weber, Klaus; Blakers, Andrew
TypeConference paper
Date Published2005
Date CreatedJune 6 2005

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