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Choi Dry_etching_characteristics_2008.pdf.jpg

Dry etching characteristics of amorphous As₂S₃ film in CHF₃ plasma

Author(s)Madden, Steve; Rode, Andrei; Wang, Rongping; Luther-Davies, Barry; Choi, Duk-Yong
TypeJournal article
Date Published15-Dec-2008
Date Created-
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