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Plasma etching of As2S3 films for optical waveguides

Author(s)Madden, Steve; Rode, Andrei V; Wang, Rongping; Luther-Davies, Barry; Choi, Duk-Yong
TypeJournal article
Date Published2008
Date Created-
Choi_Integrated2007.pdf.jpg

Integrated shadow mask for sampled Bragg gratings in chalcogenide (As2S3) planar waveguides

Author(s)Madden, Steve; Rode, Andrei V; Wang, Rongping; Luther-Davies, Barry; Baker, Neil J; Eggleton, Benjamin J; Choi, Duk-Yong
TypeJournal article
Date Published7-Jun-2008
Date Created-

Surface Roughness in Plasma-Etched As2S3 Films: Its origin and improvement

Author(s)Madden, Steve; Rode, Andrei V; Wang, Rongping; Ankiewicz, Adrian; Luther-Davies, Barry; Choi, Duk-Yong
TypeJournal article
Date Published2008
Date Created-

A protective layer on As2S3 film for photo-resist patterning

Author(s)Madden, Steve; Rode, Andrei V; Wang, Rongping; Bulla, Douglas; Luther-Davies, Barry; Choi, Duk-Yong
TypeJournal article
Date Published2008
Date Created-
Choi Dry_etching_characteristics_2008.pdf.jpg

Dry etching characteristics of amorphous As₂S₃ film in CHF₃ plasma

Author(s)Madden, Steve; Rode, Andrei; Wang, Rongping; Luther-Davies, Barry; Choi, Duk-Yong
TypeJournal article
Date Published15-Dec-2008
Date Created-
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