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Surface Roughness in Plasma-Etched As2S3 Films: Its origin and improvement

Author(s)Madden, Steve; Rode, Andrei V; Wang, Rongping; Ankiewicz, Adrian; Luther-Davies, Barry; Choi, Duk-Yong
TypeJournal article
Date Published2008
Date Created-
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Updated:  19 May 2016/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator