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01_Choi_Thermal_annealing_of_arsenic_2010.pdf.jpg

Thermal annealing of arsenic tri-sulphide thin film and its influence on device performance

Author(s)Madden, Steve; Bulla, Douglas; Wang, Rongping; Rode, Andrei; Luther-Davies, Barry; Choi, Duk-Yong
TypeJournal article
Date Published4-Mar-2010
Date Created-
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