Annealing of nanoindentation-induced high pressure crystalline phases created in crystalline and amorphous silicon
Thermally induced phase transformation of Si-III/Si-XII zones formed by nanoindentation has been studied during low temperature (200<T<300 °C) thermal annealing by Raman microspectroscopy and transmission electron microscopy. Two sizes of spherical indenter tips have been used to create substantially different volumes of phase transformed zones in both crystalline (c-Si) and amorphous silicon (a-Si) to study the zone size and starting matrix effects. The overall transformation is from...[Show more]
|Collections||ANU Research Publications|
|Source:||Journal of Applied Physics|
|Ruffell_Annealing2009.pdf||261.21 kB||Adobe PDF|
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