Thin-film adhesion changes induced by electron irradiation
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Mitchell, I. V.
Williams, J. S.
Smith, P.
Elliman, R. G.
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Abstract
The adhesion of thin films of gold, sputter deposited onto silicon, is shown to be improved by subsequent irradiation with 5-30-keV electrons. The similarities between electron and heavy ion irradiation effects suggest a common (electronic) origin for the change in interfacial bonding.
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Applied Physics Letters
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