Highly Transparent Nanoscale Tunnel Oxide Polysilicon Passivated Contacts: Optimisation, Analysis, and Impact Study
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Fong, Kean Chern
Armand, Stephane
Basnet, Rabin
Yan, Di
Ernst, Marco
De Carvalho, Gabriel Bartholazzi Lugao
Varghese, Anitta Rose
Maqsood, Muhammad Faheem
Kremer, Felipe
Wang, Jiali
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Abstract
The presented work on nanometre scale ultra-thin tunnel oxide passivated contact (UT-TOPCon) technology presents a promising pathway for enhancing power conversion efficiency in Si solar cells by mitigating parasitic optical losses. The in-depth optimisation demonstrates record-low surface recombination currents for a polysilicon layer under 3 nm thick, measuring 0.8 fAcm−2 on planar and 1.3 fAcm−2 on textured surfaces. Low specific contact resistivities between 2.5 and 5 mΩcm2 were measured on various samples, confirming its excellent carrier transport properties. Furthermore, optical properties were characterised and the opto-electrical inputs were incorporated into a comprehensive numerical simulation study to evaluate the impact of its application for Si-perovskite tandem and various single-junction Si cell architectures. The results indicate significant performance improvements to Si-perovskite tandem devices, and very high efficiency potential of 26.7% in front and rear UT-TOPCon designs and up to 27.5% in interdigitated back-contact UT-TOPCon structures.
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Solar RRL
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