Characterization of ion track morphology formed by swift heavy ion irradiation in silicon oxynitride films

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Mota-Santiago, P.
Schauries, D.
Nadzri, A.
Vora, K.
Ridgway, M. C.
Kluth, P.

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Amorphous silicon oxynitride (SiOxNy) possess interesting optical and mechanical properties. Here, we present direct evidence for the formation of ion tracks in 1 μm thick silicon oxynitride of different stoichiometries. The tracks were created by irradiation with 185 MeV Au13+ ions. The samples were studied using spectral reflectometry and Rutherford backscattering spectrometry (RBS), with the track morphology characterised by means of small angle X-ray scattering (SAXS). The radial density of the ion tracks resembles a core-shell structure with a typical radius of ∼ 1.8 + 2.4 nm in the case of Si3N4 and 2.3 + 3.2 nm for SiO2.

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EPJ Web of Conferences

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