Improvement in semiconductor laser printing using a sacrificial protecting layer for organic thin-film transistors fabrication
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Rapp, Ludovic
Cibert, Christophe
Nénon, Sébastien
Alloncle, Anne Patricia
Nagel, Matthias
Lippert, Thomas
Videlot-Ackermann, Christine
Fages, Frédéric
Delaporte, Philippe
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Abstract
Laser-induced forward transfer (LIFT) has been used to deposit pixels of an organic semiconductor, distyryl-quaterthiophenes (DS4T). The dynamics of the process have been investigated by shadowgraphic imaging for the nanosecond (ns) and picosecond (ps) regime on a time-scale from the laser iradiation to 1.5 μs. The morphology of the deposit has been studied for different conditions. Intermediate sacrificial layer of gold or triazene polymer has been used to trap the incident radiation. Its role is to protect the layer to be transferred from direct irradiation and to provide a mechanical impulse strong enough to eject the material.
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Applied Surface Science
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