Comparative study of the electrical and structural characterization of the sub-threshold damage in n- and p-type Si implanted with MeV ions

dc.contributor.authorFatima, S.en
dc.contributor.authorWong-Leung, J.en
dc.contributor.authorFitzgerald, J.en
dc.contributor.authorJagadish, C.en
dc.date.accessioned2025-12-31T22:41:02Z
dc.date.available2025-12-31T22:41:02Z
dc.date.issued1999en
dc.description.abstractSub-threshold damage in n and p-type Si implanted and annealed at elevated temperature is characterized using deep level transient spectroscopy (DLTS) and transmission electron microscopy (TEM). Irrespective of the ion mass, DLTS spectra show a transition or critical dose below which point defects in p-type Si and no electrically active defects in n-type Si are transformed in to extended defect signatures above this dose. DLTS observation correlates well with the TEM analysis; for the doses above critical dose extended defects are observed. Furthermore, mass of the implanted ion has been found effecting the type of extended defects even though the doses were adjusted to create a similar damage distribution for all the implanted ions.en
dc.description.statusPeer-revieweden
dc.format.extent4en
dc.identifier.otherORCID:/0000-0003-1528-9479/work/167653567en
dc.identifier.scopus0032684580en
dc.identifier.urihttps://hdl.handle.net/1885/733798538
dc.language.isoenen
dc.relation.ispartofseriesProceedings of the 1998 Conference on Optoelectronic and Microelectronic Materials and Devicesen
dc.titleComparative study of the electrical and structural characterization of the sub-threshold damage in n- and p-type Si implanted with MeV ionsen
dc.typeConference paperen
dspace.entity.typePublicationen
local.bibliographicCitation.lastpage508en
local.bibliographicCitation.startpage505en
local.contributor.affiliationFatima, S.; Department of Electronic Materials Engineering, Research School of Physics, ANU College of Science and Medicine, The Australian National Universityen
local.contributor.affiliationWong-Leung, J.; Department of Electronic Materials Engineering, Research School of Physics, ANU College of Science and Medicine, The Australian National Universityen
local.contributor.affiliationFitzgerald, J.; School Projects, Research School of Earth Sciences, ANU College of Science and Medicine, The Australian National Universityen
local.contributor.affiliationJagadish, C.; Department of Electronic Materials Engineering, Research School of Physics, ANU College of Science and Medicine, The Australian National Universityen
local.identifier.ariespublicationU3488905xPUB16254en
local.identifier.doi10.1109/COMMAD.1998.791701en
local.identifier.puree65d0d7d-99f2-463a-a8a7-da73f64d51cfen
local.identifier.urlhttps://www.scopus.com/pages/publications/0032684580en
local.type.statusPublisheden

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