MeV In-ion implantation for electrical isolation of p<sup>+</sup>-InP
| dc.contributor.author | Ridgway, M. C. | en |
| dc.contributor.author | Elliman, R. G. | en |
| dc.contributor.author | Hauser, N. | en |
| dc.date.accessioned | 2026-01-03T11:41:30Z | |
| dc.date.available | 2026-01-03T11:41:30Z | |
| dc.date.issued | 1993 | en |
| dc.description.abstract | Electrical isolation of p+-InP by MeV In-ion implantation has been compared with a multiple low-energy, O-ion implant sequence. The large straggle associated with an MeV In-ion implant results in a disorder level of comparable uniformity to that achieved with an O-ion implant sequence. The two implant schemes yield similar maximum sheet resistance values (∼ 6×106 Ω/sq) and thermal stabilities (400°C). However, the significant process simplification inherent with a single In-ion implant is advantageous. | en |
| dc.description.sponsorship | We are grateful to the Australian Telecommunications and Electronics Research Board, the Generic Industrial Research and Development Board of Australia and the Bilateral Science and Technology Program of the Department of Industry, Technology and Commerce for financial assistance . | en |
| dc.description.status | Peer-reviewed | en |
| dc.format.extent | 3 | en |
| dc.identifier.issn | 0168-583X | en |
| dc.identifier.other | ORCID:/0000-0002-1304-4219/work/167651093 | en |
| dc.identifier.scopus | 0001454910 | en |
| dc.identifier.uri | https://hdl.handle.net/1885/733803353 | |
| dc.language.iso | en | en |
| dc.source | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | en |
| dc.title | MeV In-ion implantation for electrical isolation of p<sup>+</sup>-InP | en |
| dc.type | Journal article | en |
| dspace.entity.type | Publication | en |
| local.bibliographicCitation.lastpage | 837 | en |
| local.bibliographicCitation.startpage | 835 | en |
| local.contributor.affiliation | Ridgway, M. C.; Department of Electronic Materials Engineering, Research School of Physics, ANU College of Science and Medicine, The Australian National University | en |
| local.contributor.affiliation | Elliman, R. G.; Department of Electronic Materials Engineering, Research School of Physics, ANU College of Science and Medicine, The Australian National University | en |
| local.contributor.affiliation | Hauser, N.; Australian National University | en |
| local.identifier.citationvolume | 80-81 | en |
| local.identifier.doi | 10.1016/0168-583X(93)90693-Z | en |
| local.identifier.pure | 23dd60db-75d1-4870-acf2-7597de4353d9 | en |
| local.identifier.url | https://www.scopus.com/pages/publications/0001454910 | en |
| local.type.status | Published | en |