Wetting, solubility and chemical characteristics of plasma-polymerized 1-isopropyl-4-methyl-1,4-cyclohexadiene thin films

dc.contributor.authorAhmad, Jakariaen
dc.contributor.authorBazaka, Katerynaen
dc.contributor.authorOelgemöller, Michaelen
dc.contributor.authorJacob, Mohan V.en
dc.date.accessioned2025-06-11T17:39:04Z
dc.date.available2025-06-11T17:39:04Z
dc.date.issued2014-09-01en
dc.description.abstractInvestigations on the wetting, solubility and chemical composition of plasma polymer thin films provide an insight into the feasibility of implementing these polymeric materials in organic electronics, particularly where wet solution processing is involved. In this study, thin films were prepared from 1-isopropyl-4-methyl-1,4-cyclohexadiene (γ-Terpinene) using radio frequency (RF) plasma polymerization. FTIR showed the polymers to be structurally dissimilar to the original monomer and highly cross-linked, where the loss of original functional groups and the degree of cross-linking increased with deposition power. The polymer surfaces were hydrocarbon-rich, with oxygen present in the form of O-H and C=O functional groups. The oxygen content decreased with deposition power, with films becoming more hydrophobic and, thus, less wettable. The advancing and receding contact angles were investigated, and the water advancing contact angle was found to increase from 63.14° to 73.53° for thin films prepared with an RF power of 10 W to 75 W. The wetting envelopes for the surfaces were constructed to enable the prediction of the surfaces' wettability for other solvents. The effect of roughness on the wetting behaviour of the films was insignificant. The polymers were determined to resist solubilization in solvents commonly used in the deposition of organic semiconducting layers, including chloroform and chlorobenzene, with higher stability observed in films fabricated at higher RF power.en
dc.description.statusPeer-revieweden
dc.format.extent26en
dc.identifier.scopus84929452556en
dc.identifier.urihttp://www.scopus.com/inward/record.url?scp=84929452556&partnerID=8YFLogxKen
dc.identifier.urihttps://hdl.handle.net/1885/733758860
dc.language.isoenen
dc.rightsPublisher Copyright: © 2014 by the authors.en
dc.sourceCoatingsen
dc.subjectCoatingsen
dc.subjectContact angleen
dc.subjectFTIRen
dc.subjectPlasma polymerizationen
dc.subjectWettingen
dc.titleWetting, solubility and chemical characteristics of plasma-polymerized 1-isopropyl-4-methyl-1,4-cyclohexadiene thin filmsen
dc.typeJournal articleen
dspace.entity.typePublicationen
local.bibliographicCitation.lastpage552en
local.bibliographicCitation.startpage527en
local.contributor.affiliationAhmad, Jakaria; James Cook University Queenslanden
local.contributor.affiliationBazaka, Kateryna; James Cook University Queenslanden
local.contributor.affiliationOelgemöller, Michael; James Cook University Queenslanden
local.contributor.affiliationJacob, Mohan V.; James Cook University Queenslanden
local.identifier.citationvolume4en
local.identifier.doi10.3390/coatings4030527en
local.identifier.pured8b8e883-4b4f-43c6-86ff-c29a2cecd258en
local.identifier.urlhttps://www.scopus.com/pages/publications/84929452556en
local.type.statusPublisheden

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