Production and processing of semiconductor nanocrystals and nanostructures for photonic applications

Abstract

This brief review focuses on the production and processing of nanocrystals and nanostructures in silicon, silicon dioxide and compound semiconductors. In each area the use of ion beams to either form or process the nanostructures features prominently. Three specific examples are given, i) Ion irradiation of semiconductors can be used for the formation of novel nanostructures such as the generation of a band of small voids or cavities that exhibit interesting properties, ii) Direct ion implantation into silicon dioxide can lead to the production of small nanocrystals, of silicon for example, that can emit light and have potential applications in novel optical devices on a silicon chip, iii) Novel, optically-emitting semiconductor nanostructures such as quantum wells and quantum dots can be grown by metal organic chemical vapour deposition on both gallium arsenide and indium phosphide substrates and ion irradiation can be used to tune the wavelength of the emitted light for device applications.